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Magnetron  Sputter Target PVD Coating Materials Metal And Alloy Sputter Target
Magnetron  Sputter Target PVD Coating Materials Metal And Alloy Sputter Target
Magnetron  Sputter Target PVD Coating Materials Metal And Alloy Sputter Target
Magnetron  Sputter Target PVD Coating Materials Metal And Alloy Sputter Target
Magnetron  Sputter Target PVD Coating Materials Metal And Alloy Sputter Target
Magnetron  Sputter Target PVD Coating Materials Metal And Alloy Sputter Target
Magnetron  Sputter Target PVD Coating Materials Metal And Alloy Sputter Target
Magnetron  Sputter Target PVD Coating Materials Metal And Alloy Sputter Target

Magnetron Sputter Target PVD Coating Materials Metal And Alloy Sputter Target

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Quick Details

Model Number:
sputtering target
Shape:
circular, rectangular, rotary
Material:
metal, precious metal, rare earth metal
Chemical Composition:
pure metal
Product name:
Sputter Target PVD Coating Materials Metal And Alloy Sputter Target
Type:
Pure metal
Color:
Metal Color
Purity:
99.99%
Size:
Accept Custom
Usage:
thin film coating
Certificate:
ISO9001
Grade:
Industrial Grade
Main Market:
Globle
MOQ:
1 Pc

Quick Details

Application:
PVD process
Place of Origin:
Hunan, China
Brand Name:
XK
Model Number:
sputtering target
Shape:
circular, rectangular, rotary
Material:
metal, precious metal, rare earth metal
Chemical Composition:
pure metal
Product name:
Sputter Target PVD Coating Materials Metal And Alloy Sputter Target
Type:
Pure metal
Color:
Metal Color
Purity:
99.99%
Size:
Accept Custom
Usage:
thin film coating
Certificate:
ISO9001
Grade:
Industrial Grade
Main Market:
Globle
MOQ:
1 Pc

Magnetron  Sputter Target PVD Coating Materials Metal And Alloy Sputter Target

Changsha Xinkang Advanced Materials Co.,Ltd is a professional producer of PVD coating materials, we are engaged in producing and suppling the most suitable and high quality metal sputtering targets.

We can produce and supply most of the metal materials on the periodic table, including rare earth metals. We generally use the production process of vacuum melting and hot pressing. By controlling the technical parameters of the processes of forging, rolling and annealing, the finished sputtering target has the characteristics of high density, low gas content, uniform internal structure, the end user can obtain constant erosion rates and high pure and homogeneous thin films during PVD process.

Titanium sputtering target Chromium sputtering target
Copper sputtering target Aluminum sputtering target
Tungsten sputtering target Molybdenum sputtering target
Tantalum sputtering target Niobium sputtering target
Zirconium sputtering target Hafnium sputtering target
Zinc sputtering target Tin sputtering target
Cobalt sputtering target Iron sputtering target

Contact Now For Free Sample And Quotation!!!

Contact Now For Free Sample And Quotation!!!

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