DC/RF Dual-Head High Vacuum 2 inches Magnetron Plasma Sputtering Coater - VTC-600-2HD-LD

• Single-phase 220 VAC 50 / 60 Hz
• 2000 W (including a vacuum pump and water chiller)

• Two sputtering power sources are integrated into one control box (Click picture below to see detailed specs)
• DC source: 500 W power for coating metallic materials
• RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials

Magnetron Sputtering Head

• Two 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included
• One Sputtering Head Model also available on this product page
• One is connected to DC source for coating metallic materials
• The other one is connected to the RF source for non-conductive materials
• Target size requirement: 2" diameter
• Thickness range: 0.1 - 5 mm for both metallic and non-conductive targets (including the backing plate)
• One Stainless Steel Target target and one Research Grade Al2O3 target are included for demo testing
• Optional 2" sputtering targets (or backing plate) are available upon request at extra cost.
• Recommended Sputtering Recipe and Useful Tips
• Customized coater: Two DC heads without RF; two RF heads without DC; 3 RF heads are available upon request
• Optional: 148 cm RF cable can be ordered at extra cost for the replacement

Vacuum Chamber

• Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel
• Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement
• Hinged type lid with pneumatic power pole allows easy target change

Sample Stage

• The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover
• Sample holder size: 140 mm Dia. for. 4" wafer max
• Rotation speed: 1 - 20 rpm adjustable for uniform coating
• The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller

Gas Flow Control

• Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gasses
• Flow rate: 0 – 200 mL/min adjustable on the touch screen control panel
• Air inlet valve is installed for vacuum release

• A mobile pump station is included. The sputtering coater can be placed on top of the station
• High-speed turbopump at speed 80L/S is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed
• Standard vacuum level connected with chamber: < 4.0E-5 Torr.
• Optional at extra cost
• If choose a 150L/S high-speed turbopump , a vacuum can reach 10-6 torr  with a chamber  ( 6x10-7 torr with baking)
• For the ultra-high vacuum up to 10^-7 torr, a getter pump (100L/s H2 & O2) is needed in addition to the turbopump. Please consult our engineers for detailed customization.

• One digital temperature-controlled recirculating water chiller is included. (Click picture to see details)
• Refrigeration range: 5~35 °C
• Flow rate: 16 L/min
• Pump pressure: 14 psi

• Precise quartz Film Thickness Monitor is optional, which can be into the chamber to monitor coating thickness with an accuracy of 0.10 Å
• Precision Thin Film & Coating Analysis Systems - EQ-TFMS-LD is available at extra cost
• Various 2” oxide and metallic targets are available upon request at extra cost. Silver epoxy and copper backing plates can be ordered at us

Overall Dimensions

Lid closed: 48" × 28" × 32"                              Lid open: 48" × 28" × 37"

Net Weight of Coater

• 160 kg

Shipping Weight & Dimensions

• Total 2 Pallets
• #1: 520 lbs, 52" x 40" x 50"
• #2: 420 lbs, 48" x 40" x 45"

Compliance

• CE approval

Warranty

• One year limited warranty with lifetime support