- Product Details
- {{item.text}}
Quick Details
-
Brand Name:
-
NST
-
Dimension(L*W*H):
-
450*350mm
-
Weight (KG):
-
300
-
Keywordsjavascript:;:
-
Multifunctional Thin Film Deposition System
Quick Details
-
Machine Type:
-
Metal and thin film coater, Coating Equipment, Laboratory Equipment
-
Marketing Type:
-
Hot Product 2024
-
Place of Origin:
-
Uttar Pradesh, India
-
Brand Name:
-
NST
-
Dimension(L*W*H):
-
450*350mm
-
Weight (KG):
-
300
-
Keywordsjavascript:;:
-
Multifunctional Thin Film Deposition System
Specification
|
Product Specification
|
|
|
||
|
Vacuum chamber
|
|
Circular type vacuum chamber,size: dia. 450×350mm
|
||
|
Vacuum system configuration
|
|
Compound molecular pump, mechanical pump, gate valve
|
||
|
ultimate pressure
|
|
≦6.67*10-5Pa(After baking degassing)
|
||
|
Vacuum recovery time
|
|
Up to 6. 6*10-4Pa in 40 minutes. (the system briefly exposes the atmosphere and fills with dry nitrogen to start pumping)
|
||
|
Magnetron target component
|
|
3 sets of permanent magnetic targets; target size dia. 60mm (one of the targets can sputtering ferromagnetic material). The RF
beach and DC cutoff of each target are compatible; and the distance between target and sample is adjustable from 90mm to 100mm; when direct upward sputtering, the distance between target and sample is adjustable from 40mm to 80mm. |
||
|
Water-cooling Substrate Heating Revolution Table
|
Substrate Structure
|
The substrate heating and water cooling work independently, and the heating furnace can be replaced by water cooling substrates
|
||
|
|
Sample size
|
Dia. 30mm
|
||
|
|
Mode of motion
|
The substrate can rotate continuously, and the rotation speed is 5-10 RPM
|
||
|
|
Heating
|
Max. Temperature 600℃±1℃
|
||
|
|
Substrate Negative Bias
|
-200V
|
||
|
Gas channel system
|
|
2-channel Mass Flow Controller (MFC)
|
||
|
Optional parts 6 station base plate heating revolution table
|
|
Removing the single substrate, The water heating platform can be replaced on the rotary table. 6 sheets of 30mm substrates can be
placed simultaneously; Among the six stations, one of them is installed with heating furnace, while the rest are natural cooling substrates. Maximum temperature of substrate heating: 600℃±1℃ |
||
|
Computer Control System
|
|
Control sample rotation, baffle switch, target identification, etc.
|
||
|
Floor Occupied
|
Main machine
|
1300×800mm2
|
||
|
|
Electrical Cabinet
|
700×700mm2
|
||
Product Description
Single chamber magnetron sputtering system
Single chamber magnetron sputtering system is used for the preparation of novel thin film materials such as nanometer single-layer and multi-layer functional film, hard film, metal film, semiconductor film and dielectric film. It can be widely used in the research of thin film materials and the production of small batch. It can be widely used in universities and colleges, scientific research institutes of thin film materials preparation research and small batch.
Packing & Delivery
To better ensure the safety of your goods, professional, environmentally friendly, convenient and efficient packaging services will be provided.
Hot Searches
