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99.95% tantalum tube PVD coating use tantalum sputtering target
99.95% tantalum tube PVD coating use tantalum sputtering target
99.95% tantalum tube PVD coating use tantalum sputtering target
99.95% tantalum tube PVD coating use tantalum sputtering target
99.95% tantalum tube PVD coating use tantalum sputtering target
99.95% tantalum tube PVD coating use tantalum sputtering target
99.95% tantalum tube PVD coating use tantalum sputtering target
99.95% tantalum tube PVD coating use tantalum sputtering target

99.95% tantalum tube PVD coating use tantalum sputtering target

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≥1 Pieces
US $6360
≥3 Pieces
US $6330
≥5 Pieces
US $6300
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Quick Details

Model Number:
ATM-Ta
Shape:
tube,rotary, Rotary
Material:
tantalum
Chemical Composition:
Ta
Product name:
tantalum tube
Purity:
3N5
Color:
Dark Gray
Size:
ID50*OD60*620 mm
Usage:
PVD coating
MOQ:
1pc
Certificate:
ISO9001,COA
Package:
Vacuum Package
Delivery time:
15-25 days

Quick Details

Application:
surface coating
Place of Origin:
Hebei, China
Brand Name:
ATM
Model Number:
ATM-Ta
Shape:
tube,rotary, Rotary
Material:
tantalum
Chemical Composition:
Ta
Product name:
tantalum tube
Purity:
3N5
Color:
Dark Gray
Size:
ID50*OD60*620 mm
Usage:
PVD coating
MOQ:
1pc
Certificate:
ISO9001,COA
Package:
Vacuum Package
Delivery time:
15-25 days
Products Description
Rotary shape tantalum tube target
Size: outer diameter 60mm,inner diameter 50mm,length 620mm
Popular standard size or OEM machining
Advanced :
(1) Smooth surface without pore,scratch and other imperfection
(2) Grinding or lathing edge, no cutting marks
(3) Unbeatable level of material purity
(4) High ductility
(5) Homogeneous micro structure
(6) Laser marking for your special Item with name, brand, purity size and so on
(7)Every pcs of sputtering targets from the powder materials item&number, mixing workers,outgas and HIP time,machining person and packing details are all made ourselves.
All of those step can promise you once a new sputtering target or method is created ,it could be copied and kept to support a stable quality products.
Item
Chemical composition
3N5 Ta Target
Item
Chemical composition
3N5 Ta Target
C
< 10 ppm
Si
< 10 ppm
N
< 5 ppm
Ti
< 10 ppm
O
< 20 ppm
Cr
< 10 ppm
S
< 10 ppm
Mn
< 10 ppm
H
< 5 ppm
Fe
< 10 ppm
Ni
< 10 ppm
Cu
< 10 ppm
Zr
< 10 ppm
Nb
< 150 ppm
Mo
< 10 ppm
W
< 100 ppm
Popular Usage
Tantalum Sputtering Target usually applied for magnetic recording media, printer components, flat panel displays, optic, industrial glass, and thin film resistors. High purity Tantalum Sputtering Target is normally used for semiconductor industry. Its high natural strength with low thermal expansion coefficient, together with its ability to stick to both copper and silicon make it the perfect choice for a diffusion barrier to prevent copper and silicon from interacting.
Typical targets we are supplying in the market:
Details Images
High density
Uniform and fine grained micro structure
Homogeneous concerning distribution of chemical elements
Low content of residual impurities
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