the solid surface. The ions and the atoms on the solid surface exchange kinetic energy, so that the atoms on the solid surface
leave the solid and deposit on the base surface. The solid bombarded is the sputtering target.
- Product Details
- {{item.text}}
Quick Details
-
Model Number:
-
YUNCH-TI-Target
-
Shape:
-
Round, Planner Plate
-
Material:
-
Pure titanium
-
Chemical Composition:
-
99.995% Titanium
-
Product name:
-
Customized Metal Alloy Niobium Titanium NbTi sputtering target
-
Usage:
-
Sputtering Target for Glass Coating
-
Chemical composition:
-
Pure titanium
-
Purity:
-
5N 99.999% High Purity Titanium
-
Produce Method:
-
HIP
-
Finish:
-
Polish, Mirror polish, etc
-
Color:
-
Titanium Nature Color
-
Marking method:
-
Electrocorrosion, Laser marking etc
-
Certification:
-
MTC3.1
Quick Details
-
Application:
-
Sputtering Target for Glass Coating
-
Place of Origin:
-
Shaanxi, China
-
Brand Name:
-
YUNCH
-
Model Number:
-
YUNCH-TI-Target
-
Shape:
-
Round, Planner Plate
-
Material:
-
Pure titanium
-
Chemical Composition:
-
99.995% Titanium
-
Product name:
-
Customized Metal Alloy Niobium Titanium NbTi sputtering target
-
Usage:
-
Sputtering Target for Glass Coating
-
Chemical composition:
-
Pure titanium
-
Purity:
-
5N 99.999% High Purity Titanium
-
Produce Method:
-
HIP
-
Finish:
-
Polish, Mirror polish, etc
-
Color:
-
Titanium Nature Color
-
Marking method:
-
Electrocorrosion, Laser marking etc
-
Certification:
-
MTC3.1
Overview
Customized Metal Alloy Niobium Titanium NbTi sputtering target
It uses the ions generated by the ion source to form a high velocity ion beam after accelerated aggregation in vacuum, bombarding
the solid surface. The ions and the atoms on the solid surface exchange kinetic energy, so that the atoms on the solid surface
leave the solid and deposit on the base surface. The solid bombarded is the sputtering target.
the solid surface. The ions and the atoms on the solid surface exchange kinetic energy, so that the atoms on the solid surface
leave the solid and deposit on the base surface. The solid bombarded is the sputtering target.
|
Technique
|
Forging, Machining
|
|
Status
|
Annealed
|
|
Type
|
Round target
|
|
Surface
|
CNC lathe surface
|
|
Certificate
|
SO9001:2015, TUV, SGS, EN10204.3.1
|
|
Application
|
1. Medical: titanium alloy (Ti6Al4V-ELI F136) and cp titanium(Ti Gr.2 F67)
2. Used in semiconductor, chemical vapor
deposition(CVD) and physical vapor deposition(PVD) display and optical applications |
|
Specifications
|
Chromium
|
Chrome aluminum
|
Titanium
|
|
Content
|
99.99%
|
99.99%
|
99.99%
|
|
Density
|
7.19cm³/g
|
customized
|
4.5cm³/g
|
|
Average
particle size
|
≤50um
|
≤50um
|
≤50um
|
|
Shape
(Max or Minimum)
|
Customized
|
Customized
|
customized
|
|
Sintering technology
|
Hot isostatic
pressure
|
Hot isostatic
pressure
|
Hot isostatic
pressure
|
|
Oxygen content
|
≤150ppm
|
≤150ppm
|
≤100ppm
|
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