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Silicon dioxide ceramic SiO2 4N Sputtering Target
Silicon dioxide ceramic SiO2 4N Sputtering Target
Silicon dioxide ceramic SiO2 4N Sputtering Target
Silicon dioxide ceramic SiO2 4N Sputtering Target
Silicon dioxide ceramic SiO2 4N Sputtering Target
Silicon dioxide ceramic SiO2 4N Sputtering Target
Silicon dioxide ceramic SiO2 4N Sputtering Target
Silicon dioxide ceramic SiO2 4N Sputtering Target

Silicon dioxide ceramic SiO2 4N Sputtering Target

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≥1 Pieces
US $100
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Quick Details

Material:
SiO2
Chemical Composition:
99.995% min.
Density:
2.2g/cm³
Shapes:
Round, Square or Customized
Sizes:
Thickness: 3mm min.
Surface Condition:
ground
Processing method:
Fusion & Machining
Processing Service:
Bonding: Indium or Elastomer
Application:
Semiconductors,displays,magnetic/optical recording, superconductivity

Quick Details

Place of Origin:
Liaoning, China
Brand Name:
King Choice
Model Number:
DCT-560
Material:
SiO2
Chemical Composition:
99.995% min.
Density:
2.2g/cm³
Shapes:
Round, Square or Customized
Sizes:
Thickness: 3mm min.
Surface Condition:
ground
Processing method:
Fusion & Machining
Processing Service:
Bonding: Indium or Elastomer
Application:
Semiconductors,displays,magnetic/optical recording, superconductivity
Products Characteristic
Products Description
Product Name
Purity
Density
Processing Method
Surface Condition
Al2O3 Target
4N
3.5g/cm³-3.9g/cm³
HP















Ground




AZO Target
3N5
5.52g/cm3
Sintering
ITO Target
4N
7.15g/cm3
Sintering
Nb2O5 Target
4N
-
HIP
Ta2O5 Target
3N5
5.2
HP
TiO2 Target
3N5
4.24
HP
BaSrTiO3 Target
3N
-
HP
Ground
IGZO Target
4N
-
HP
SiO2 Target
4N
2.2g/cm3
Melt
MgO Target
3N5
3.5g/cm3
HP
Cu2O+Nb2O5 Target
4N
-
HP
TiO2+Nb2O5 Target
4N
-
HP
NiO Target
4N
6.6g/cm3
HP
ZnO Target
4N
5.6g/cm3
HP
ZrO2 Target
3N5
5.46g/cm3
HP
MoO3 Target
3N5
-
HP
WO3 Target
3N5
-
HP
ITZO Target
4N
-
HP
TiO2+AlN Target
3N
-
HP
ZnO+SnO2 Target
4N
-
HP
Cr2O3 Target
3N
-
HP

Application

Silicon dioxide, also known as Silica, is evaporated under vacuum to make photovoltaic and circuit devices. SiO2 target is often used as optical glass and semiconductor material because of its physical properties of fire-resistance, high-temperature-resistance, insulation, anti-corrosion and optical properties.
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