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Ceramic Vacuum Chuck Table For Wafer Processing Semiconductor  Field
Ceramic Vacuum Chuck Table For Wafer Processing Semiconductor  Field
Ceramic Vacuum Chuck Table For Wafer Processing Semiconductor  Field
Ceramic Vacuum Chuck Table For Wafer Processing Semiconductor  Field
Ceramic Vacuum Chuck Table For Wafer Processing Semiconductor  Field
Ceramic Vacuum Chuck Table For Wafer Processing Semiconductor  Field
Ceramic Vacuum Chuck Table For Wafer Processing Semiconductor  Field
Ceramic Vacuum Chuck Table For Wafer Processing Semiconductor  Field

Ceramic Vacuum Chuck Table For Wafer Processing Semiconductor Field

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≥10 Pieces
US $500
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Quick Details

Place of Origin:
Henan, China
Brand Name:
GSG
Model Number:
N
Product Name:
Fine pore ceramic vacuum chuck table
Application:
Supporting and chucking semiconductor wafer
Size:
4'' , 6'', 8'' 12''
parallelism:
3μm, 5μm, 6μm
Working life:
Long life span
Performance:
High
Suitable devices:
Wafer grinder, dicing machine and cleaning machine, etc.
Workpiece processed:
2, 3, 4, 5, 6, 8, 12 inches semiconductor wafer

Quick Details

Number of Jaws:
4, 6
Material:
Stainless steel, Ceramic
Warranty:
n
Place of Origin:
Henan, China
Brand Name:
GSG
Model Number:
N
Product Name:
Fine pore ceramic vacuum chuck table
Application:
Supporting and chucking semiconductor wafer
Size:
4'' , 6'', 8'' 12''
parallelism:
3μm, 5μm, 6μm
Working life:
Long life span
Performance:
High
Suitable devices:
Wafer grinder, dicing machine and cleaning machine, etc.
Workpiece processed:
2, 3, 4, 5, 6, 8, 12 inches semiconductor wafer
Product Description

Fine pore ceramic vacuum chuck table

Fine pore ceramic vacuum chuck table is applied in the processes of thinning, dicing, cleaning, transportation and so on. These products which have high cost performance produced by our company can match with the machines made in Japan, Germany, Israel, America and China.

Micro-porous ceramic vacuum chuck table for wafer processing has the following features:
1. Dressing easily
2. Good permeability
3. Uniform adsorption affinity
4. High flatness and parallelism
5. Compact and uniform microstructure with high strength


Fine pore ceramic vacuum chuck table is mainly used for supporting and chucking the 2, 3, 4, 5, 6, 8, 12 inches semiconductor
wafer when grinding and dicing.

Specification
Material
Stainless steel base and fine pore ceramic
Size
4''
6''
8''
12''
Parallelism
3um
3um
5um
6um
Packing & Delivery
To better ensure the safety of your goods, professional, environmentally friendly, convenient and efficient packaging services will be provided.
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