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Plasma Magnetron Sputtering Coater with Three Sputtering Sources and RF/DC Power Supplies - VTC-600-3HD-LD
Plasma Magnetron Sputtering Coater with Three Sputtering Sources and RF/DC Power Supplies - VTC-600-3HD-LD
Plasma Magnetron Sputtering Coater with Three Sputtering Sources and RF/DC Power Supplies - VTC-600-3HD-LD
Plasma Magnetron Sputtering Coater with Three Sputtering Sources and RF/DC Power Supplies - VTC-600-3HD-LD
Plasma Magnetron Sputtering Coater with Three Sputtering Sources and RF/DC Power Supplies - VTC-600-3HD-LD
Plasma Magnetron Sputtering Coater with Three Sputtering Sources and RF/DC Power Supplies - VTC-600-3HD-LD
Plasma Magnetron Sputtering Coater with Three Sputtering Sources and RF/DC Power Supplies - VTC-600-3HD-LD
Plasma Magnetron Sputtering Coater with Three Sputtering Sources and RF/DC Power Supplies - VTC-600-3HD-LD

Plasma Magnetron Sputtering Coater with Three Sputtering Sources and RF/DC Power Supplies - VTC-600-3HD-LD

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Quick Details

Voltage:
Specially customized as clients' local power
Power:
2000 W
Dimension(L*W*H):
48" * 28" * 32"
Weight (KG):
160
Product name:
Plasma Magnetron Sputtering Coater
Keywords:
Magnetron Sputtering Coater
Input Power:
Single-phase 220 VAC 50 / 60 Hz
DC source:
500 W
RF source:
300 W power, 13.56 MHz frequency
Target size requirement:
2" diameter
Thickness range:
0.1 - 5 mm
Vacuum chamber:
300 mm Dia. x 300 mm Height
Sample holder size:
140 mm Dia. for. 4" wafer max
The holder temperature:
adjustable from RT to 500 °C max

Quick Details

Machine Type:
Plasma Magnetron Sputtering Coater, Pre-treatment Equipment, Coating Equipment
Place of Origin:
Henan, China
Brand Name:
MTI
Voltage:
Specially customized as clients' local power
Power:
2000 W
Dimension(L*W*H):
48" * 28" * 32"
Weight (KG):
160
Product name:
Plasma Magnetron Sputtering Coater
Keywords:
Magnetron Sputtering Coater
Input Power:
Single-phase 220 VAC 50 / 60 Hz
DC source:
500 W
RF source:
300 W power, 13.56 MHz frequency
Target size requirement:
2" diameter
Thickness range:
0.1 - 5 mm
Vacuum chamber:
300 mm Dia. x 300 mm Height
Sample holder size:
140 mm Dia. for. 4" wafer max
The holder temperature:
adjustable from RT to 500 °C max

Plasma M agnetron Sputtering Coater with Three Sputtering Sources and RF/DC Power Supplies - VTC-600-3HD-LD

Product Description

VTC-600-3HD-LD is a combinatorial plasma sputtering system with three 2“ magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and creates various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery) . This system is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.

SPECIFICATIONS


Input Power

· Single-phase 220 VAC 50 / 60 Hz

· 2000 W (including a vacuum pump and water chiller)




Source Power

· Three sputtering power sources are integrated into one control box

o DC source: 500 W power for coating metallic materials

o RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials






Magnetron Sputtering Head

· Three 2 inches sputtering heads with water cooling jackets and shutters are included (Click 1st pic from left)

o Target size requirement: 2" diameter

o Thickness range: 0.1 - 5 mm for both metallic and non-conductive targets (including the backing plate)

· Customized coater: Two DC - One RF; Two RF - One DC; Three DC; Three RF.

· Optional: 148 cm RF cable can be ordered at extra cost for the replacement




Vacuum Chamber

· Vacuum chamber: 300 mm Dia. x 300 mm Height, made of stainless steel

· Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement

· Hinged type lid with pneumatic power pole allows easy target change




Sample Stage

· The sample holder is a rotatable and heatable stage made of the ceramic heater with copper cover

· Sample holder size: 140 mm Dia. for. 4" wafer max

· Rotation speed: 1 - 20 rpm adjustable for uniform coating

· The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller

Gas Flow Control

· Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gases

o Flow rate: 0 – 200 mL/min & 0 - 100ml/min adjustable on the touch screen control panel

· Air inlet valve is installed for vacuum release

Vacuum Pump Station

· High-speed turbopump at speed 80L/S is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed

· Standard vacuum level connected with chamber: < 4.0E-5 Torr.

· Optional at extra cost

· If choose a 150L/S high-speed turbopump , the vacuum can reach 10-6 torr with the chamber.

· For the ultra-high vacuum up to 10^-7 torr, 700S/L turbopump is needed

· 150L/S high-speed turbopump

Water Chiller

· One digital temperature-controlled recirculating water chiller is included.

o Refrigeration range: 5~35 °C

o Flow rate: 16 L/min

o Pump pressure: 14 psi

Optional

· Precise quartz Film Thickness Monitor is optional, which can be into the chamber to monitor coating thickness with an accuracy of 0.10 Å

Overall Dimensions

Lid closed: 48" × 28" × 32" Lid open: 48" × 28" × 37"

Net Weight of Coater

· 160 kg

Shipping Weight & Dimensions

· Total 3 Pallets

o 365 lbs, 48" x 40" x 45"

o 390 lbs, 48"x 40" x 49"

o 210 lbs, 48" x 40"x 30"

Compliance

· CE approval

Warranty

· One year's limited warranty with lifetime support

Application Note

This coater may be placed into a standard glovebox with modification for thin-film battery research

Product pictures

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