We provides niobium target with uniform, high-density microstructure, and controlled texture, promoting uniform sputtering rates and generally superior sputtering behavior.
- Product Details
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Quick Details
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Model Number:
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niobium targets
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Shape:
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cylinder
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Material:
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Nb>99.95%
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Chemical Composition:
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Nb
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Product name:
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niobium targets
Quick Details
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Application:
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superconductivity Magnetron
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Place of Origin:
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Henan, China
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Brand Name:
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Combat
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Model Number:
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niobium targets
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Shape:
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cylinder
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Material:
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Nb>99.95%
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Chemical Composition:
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Nb
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Product name:
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niobium targets
Specification
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item
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value
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Place of Origin
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China
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province
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Henan
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Brand Name
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Combat
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Model Number
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niobium targets
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Application
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evaporation coating
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Shape
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Rectangular, round
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Material
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Nb>99.9%, 99.95%, 99.99%, 99.995%
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Chemical Composition
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Nb
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Product name
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niobium targets
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Density
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>8.3g/cc
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Recrystallization
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>95%
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Surface Roughness
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Ra 0.8-1.6
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Flatness
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0.1mm or 0.1%
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Grade
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R04210
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Standard
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ASTM B393-05
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Product Description
Niobium Target Specifications
We can supply 8″, 12″ niobium round shape sputtering target. The largest disc target that we can provide is with 29” diameter. Below are most of the standard sizes for our tantalum rectangle sputtering targets. If you do not see the size that you need, please feel free to contact us.
How We Produce
We produces niobium sputtering target by vacuum electron beam melting technology, including square and circular niobium target. The different shape of target material cut by niobium sheet (the niobium sheet used in the target material has much difference in the internal organization structure compared with the ordinary niobium plate).
The original manufacturing process is similar to ordinary niobium plate. But we adopt the unique rolling technology to process, this process is more complex, the annealing temperature and time of cooperate is more precise, so as to ensure the tantalum target material grain size below 40 microns, and guarantee the high quality level of the tantalum target material.
For the customer’s different requirements, we provide and produce niobium sputtering target by customer drawings for production.
Niobium Target
Niobium Target Applications
Niobium sputtering target is used in electronic industry. The purity is up to 99.99%. We can offer various dimensions in round/square/rectangular shapes. Please contact us for more details.
Melting Point : 2750 K (2477°C, 4491°F)
Boiling Point: 5017 K (4744°C, 8571°F)
Heat of Fusion : 30 kJ/mol
Heat of Vaporization: 689.9 kJ/mol
Molar Heat Capacity: 24.60 J/(mol•K)
Molar Heat Capacity: 24.60 J/(mol•K)
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