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3N5 4N Tantalum Targets Metal Ta PVD Sputtering Targets For Microelectronics
3N5 4N Tantalum Targets Metal Ta PVD Sputtering Targets For Microelectronics
3N5 4N Tantalum Targets Metal Ta PVD Sputtering Targets For Microelectronics
3N5 4N Tantalum Targets Metal Ta PVD Sputtering Targets For Microelectronics
3N5 4N Tantalum Targets Metal Ta PVD Sputtering Targets For Microelectronics
3N5 4N Tantalum Targets Metal Ta PVD Sputtering Targets For Microelectronics
3N5 4N Tantalum Targets Metal Ta PVD Sputtering Targets For Microelectronics
3N5 4N Tantalum Targets Metal Ta PVD Sputtering Targets For Microelectronics

3N5 4N Tantalum Targets Metal Ta PVD Sputtering Targets For Microelectronics

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≥1 Pieces
US $60
≥10 Pieces
US $50
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Quick Details

Model Number:
XK-Ta 04
Shape:
Round, rectangular,pellets
Material:
Tantalum
Chemical Composition:
Ta
Product name:
Tantalum Targets Metal Ta PVD Sputtering Targets For Microelectronics
Purity:
99.95%
Size:
1'',2''as your request
MOQ:
1pc
Delivery time:
15-18days
Density:
16.654g/cm3
Certificate:
ISO9001:2015
Package:
Vacuum Package
Keywords:
Tantalum sputtering target
Main application:
vacuum coating, surface treatment, glass coating,

Quick Details

Application:
vacuum coating, surface treatment, glass coating,
Place of Origin:
Hunan, China
Brand Name:
XinKang
Model Number:
XK-Ta 04
Shape:
Round, rectangular,pellets
Material:
Tantalum
Chemical Composition:
Ta
Product name:
Tantalum Targets Metal Ta PVD Sputtering Targets For Microelectronics
Purity:
99.95%
Size:
1'',2''as your request
MOQ:
1pc
Delivery time:
15-18days
Density:
16.654g/cm3
Certificate:
ISO9001:2015
Package:
Vacuum Package
Keywords:
Tantalum sputtering target
Main application:
vacuum coating, surface treatment, glass coating,
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