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4N Pure Ta Tantalum Sputtering Target China Manufacturer High Purity Tantalum Sputtering Target
4N Pure Ta Tantalum Sputtering Target China Manufacturer High Purity Tantalum Sputtering Target
4N Pure Ta Tantalum Sputtering Target China Manufacturer High Purity Tantalum Sputtering Target
4N Pure Ta Tantalum Sputtering Target China Manufacturer High Purity Tantalum Sputtering Target
4N Pure Ta Tantalum Sputtering Target China Manufacturer High Purity Tantalum Sputtering Target
4N Pure Ta Tantalum Sputtering Target China Manufacturer High Purity Tantalum Sputtering Target
4N Pure Ta Tantalum Sputtering Target China Manufacturer High Purity Tantalum Sputtering Target
4N Pure Ta Tantalum Sputtering Target China Manufacturer High Purity Tantalum Sputtering Target

4N Pure Ta Tantalum Sputtering Target China Manufacturer High Purity Tantalum Sputtering Target

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≥1 Pieces
US $100
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Customized Request
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Quick Details

Shape:
Round, square
Material:
Ta
Chemical Composition:
99.99% Ta
Product name:
4N Pure Ta Tantalum Sputtering Target
Purity:
99.99%,99.95%,
Density:
16.654g/cm3
Dimension:
Customized Size
Keywords:
Tantalum Sputtering Target
Usage:
Film coating
MOQ:
1pc
Surface:
Smooth Surface
Packing:
Vacumm Bag
Certificate:
ISO 9001/14001

Quick Details

Application:
Film coating
Place of Origin:
Hunan, China
Brand Name:
Xinkang
Shape:
Round, square
Material:
Ta
Chemical Composition:
99.99% Ta
Product name:
4N Pure Ta Tantalum Sputtering Target
Purity:
99.99%,99.95%,
Density:
16.654g/cm3
Dimension:
Customized Size
Keywords:
Tantalum Sputtering Target
Usage:
Film coating
MOQ:
1pc
Surface:
Smooth Surface
Packing:
Vacumm Bag
Certificate:
ISO 9001/14001
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