- Product Details
- {{item.text}}
Quick Details
-
Model Number:
-
SCK-SPC-1
-
Place of Origin:
-
Henan, China
-
Product name:
-
magnetron sputter source
-
Application:
-
Magnetron Coating Machine
-
dia:
-
4" (customizable)
-
Water Inlet Temperature:
-
<20 C
-
Sputtering Current (Max.):
-
3 Amp
-
Sputtering Voltage:
-
100-1000 V
-
Sputtering Pressure:
-
3 /50 mTorr
-
Operating Temperature:
-
10C /1000C
Quick Details
-
Warranty:
-
1 year
-
Customized support:
-
Customized production
-
Brand Name:
-
SCK
-
Model Number:
-
SCK-SPC-1
-
Place of Origin:
-
Henan, China
-
Product name:
-
magnetron sputter source
-
Application:
-
Magnetron Coating Machine
-
dia:
-
4" (customizable)
-
Water Inlet Temperature:
-
<20 C
-
Sputtering Current (Max.):
-
3 Amp
-
Sputtering Voltage:
-
100-1000 V
-
Sputtering Pressure:
-
3 /50 mTorr
-
Operating Temperature:
-
10C /1000C
Hot Sale 4" Permanent Magnet Sputtering Target/Magnetron Sputtering Source
SCK-SPC-4 is a magnetron sputter source with a flexible head capable of accommodating a wide range of 1" Dia. sputtering sources. Its compatibility with DC, pulsed DC and RF power supplies ensures maximum versatility and extends its usage to various sputtering targets (e.g. metallic, electrically insulating, magnetic or non-magnetic, and etc). Furthermore, its high vacuum design makes the use of Argon under low-pressure levels improves the quality of coating through reducing gas collisions inside the chamber.
Circular rare-earth Nd-Fe-B magnets isolated from cooling water are implemented into the design for minimizing water-to-vacuum interfaces that are typically found in other sputtering sources. These magnets are field replaceable and make the sputtering source easy to operate and maintain. The installation of this apparatus is straight forward and it also offers simple target changes that do not require any target bonding.
(Factory supply, support customization, please contact our staff for details.)
Features of 4" magnetron sputter source
1.High field strength and uniform field profile achieved via use of electromagnetic finite element calculations in the design of the permanent magnetic assembly
2.Low impedance sputtering head and standard RF connector easily match and interface with a wide range of DC and RF sputtering power supplies.
3.Easy installation with common tools.
4.Magnets are isolated from cooling water with the protective coating against corrosion to maximize durability.
5.Sputtering source is bakeable up to 200°C,1" Copper Backing Plate is included.Standard ¾” OD Shaft,Accepts 1/8” (3 mm) thick targets; 1 piece of copper target is included as standard accessory.
technical parameter
|
Brief Introduction |
SCK-SPC-4 is a 4" dia. circular magnetron sputtering source which can accommodate a wide range of sputtering targets, such as metallic/insulating or magnetic/non-magnetic. The circular rare-earth NdFeB permanent magnet is implemented to ensure excellent film uniformity and target utilization. This sputtering source is easy to operate and maintain. Installation is straight forward and it can be operated with either DC or RF power supply. |
|
Features
|
· Made of high-quality materials of stainless steel and ceramics. · Electromagnetic finite element calculations are used in the design of the permanent magnetic assembly to achieve high field strength and uniform field profile. · The magnet is coated with protective material against cooling water corrosion to maximize durability. · Standard RF connector, which matches with a wide range of DC and RF sputtering power supplies. · The low impedance sputtering heads are easily interfaceable with an external power supply. · Easy to install a standard fitting with included quick connector · Target replacement is easy and no need to adjust the gun to fit targets with different height. |
|
Power Requirement |
· DC (Max.) 2000 W · RF (Max.) 1000 W |
|
Electrical Connection Type |
· Standard HN Female Connector is included (DC and RF ) · Optional SL16 cable Connector · 148 cm RF cable is recommended with extra cost |
|
Sputtering Current (Max.) |
3 Amp |
|
Sputtering Voltage |
100-1000 V |
|
Sputtering Pressure |
3 - 50 mTorr |
|
Operating Temperature |
10 - 1000C |
|
Dimensions |
· Total Length: 14" |
|
|
· Diameter: 4.0" · Thickness: up to 1/8" for non-magnetic target; up to 1/16" for magnetic target · Utilization: up to 30% · Magnet: NdFeB Rare Earth Magnet |
|
|
· Flow Rate: 0.8 GPM · Water Inlet Temperature: <20 ℃ · Water tubing: 0.25" O.D. |
|
Mounting |
· Feedthrough: 3/4" O.D.tube |
|
Net Weight |
6kg |
|
|
· High vacuum Quick connector with 0.75" ID is included. Use this component to install the sputtering source onto the baseplate (up to 1" thick) of a vacuum chamber with 1" diameter through-hole at easy · Digital Temperature Controlled Circulating Water Chiller with 6 Liters Tank, 16L / min Flow is available at extra cost |
1. Reply your inquiry in 24 working hours.
2. Experienced staffs answer all your questions in fluent English.
3. Customized design is available.
4. Exclusive and unique solution can be provided to our customer by our well-trained and professional engineers and staff.
5. Professional factory : We are manufacturer, specializing in laboratory equipment.
