- Product Details
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Quick Details
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Model Number:
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R05200,R05400,R05252,R05255,R05240
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Shape:
-
round, tube
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Material:
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Tantalum
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Chemical Composition:
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Ta,C,H,O,N,Fe, Mo, Nb, Ni, Si, Ti
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Feature:
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high strength,resistance to high temperaturehigh strength
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Density:
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16.6g/cm3
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Grade:
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Ta1,Ta2.5W,Ta10W
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Purity:
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99.95%
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Usage:
-
PVD coating material ,Thin Film Coating
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Color:
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Silver White
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Name:
-
tantalum material
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Size:
-
Clints Requiry
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Appearance:
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Cleaning Surface
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Product name:
-
99.95% tantalum sputtering targets
Quick Details
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Application:
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industry, chemical, aerospace, medical
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Place of Origin:
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Shaanxi, China
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Brand Name:
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tianbo metal
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Model Number:
-
R05200,R05400,R05252,R05255,R05240
-
Shape:
-
round, tube
-
Material:
-
Tantalum
-
Chemical Composition:
-
Ta,C,H,O,N,Fe, Mo, Nb, Ni, Si, Ti
-
Feature:
-
high strength,resistance to high temperaturehigh strength
-
Density:
-
16.6g/cm3
-
Grade:
-
Ta1,Ta2.5W,Ta10W
-
Purity:
-
99.95%
-
Usage:
-
PVD coating material ,Thin Film Coating
-
Color:
-
Silver White
-
Name:
-
tantalum material
-
Size:
-
Clints Requiry
-
Appearance:
-
Cleaning Surface
-
Product name:
-
99.95% tantalum sputtering targets
99.95% tantalum sputtering targets for thin film coating hot sale factory supplier manufacturer baoji tianbo metal company
Specification
Product name | Tantalum (Ta) Sputtering Target |
Material | High Purity Tantalum |
Grade | Ta1,Ta2.5W,Ta10W |
Purity | 99.95% |
Feature | high strength,resistance to high temperaturehigh strength |
Standard | High Purity, Above 99.95% |
Technique | Smelting and Casting |
Application | Decorative Coating Industry,PVD coating material ,Thin Film Coating |
Product Name : tantalum sputtering target
Density: 16.6g/cm3
Grade: Ta1,Ta2.5W,Ta10W
Purity: 99.95%
Applications : PVD coating material
Component
Element | Fe | Si | Ta | Cr | H | N | O |
Standard | 0.005 | 0.005 | 0.1 | 0.002 | 0.001 | 0.015 | 0.015 |
Measured value | 0.0015 | 0.004 | 0.03 | <0.0005 | 0.0003 | 0.002 | 0.005 |
Element | Ni | Mo | W | Ti | C | Zr | / |
Standard | 0.005 | 0.01 | 0.03 | 0.002 | 0.01 | 0.02 | / |
Measured value | <0.0005 | <0.001 | <0.003 | <0.001 | 0.001 | 0.002 | / |
processing product properties
Grade(UNS) |
Annealed |
||
Tensile strength min, psi (MPa) |
Yield strength min,psi (MPa)(2%) |
Elongation min, % (1 inch gage length) |
|
Pure Ta (RO5200, RO5400) |
30000 (207) |
20000 (138) |
20 |
Ta-10W (RO5255) |
70000 (482) |
60000 (414) |
15 |
Ta-2.5W (RO5252) |
40000 (276) |
30000 (207) |
20 |
Ta-40Nb (RO5240) |
35000 (241) |
20000 (138) |
25 |
Product Display
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High quality sputtering targets
- High density metals, oxides, alloy and doped sputtering target, High purity metals
- Purity above 99.999%, Pure metals: Al, Cu, Ti, Ni, Mg, Fe, B, Zn, W, Mo etc. Evaporation materials
- Passed the ISO9001:2008 quality system authentication and ROHS authentication.
processing available size
Thickness (mm) |
Width (mm) |
Length (mm) |
|
Foil |
0.01-0.09 |
30-150 |
>200 |
Sheet |
0.1-0.5 |
30- 609.6 |
30-1000 |
Board |
0.5-10 |
50-1000 |
50-2000 |
Why choose us?
1. Provide competitive price for you.
2. We have our own factories and production teams over other suppliers.
3. Reliable quality on the base of the same price.
4. D elivery meet your requirements
5 Generally speaking ,we can supply from stock.
6 . D o our best to meet the customer requirements.
7 . If you have any questions or need any help ,please text us at any time .