- Product Details
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Quick Details
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Brand Name:
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TN
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Voltage:
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220V
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Power:
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≤20KW
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Weight (KG):
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100
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Product name:
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Magnetron Target Sputter Coater
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Keywords:
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Easy to use
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chamber size:
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180mm x 215mm
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Sample stage size:
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150mm
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Magnetron sputtering target:
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2" x 1 target
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Ultimate vacuum:
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1.0E-4Pa
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Vacuum chamber material:
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SS304 stainless steel
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Mechanical pump:
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Imported oil-free diaphragm pump
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Vacuum measurement:
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Resistance gauge + ionization gauge
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Pumping rate:
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Oil-free pump 0.49L/s Molecular pump: 40L/S
Quick Details
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Machine Type:
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magnetron sputter coating machine, Coating Equipment
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Marketing Type:
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Hot Product 2023
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Place of Origin:
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Henan China
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Brand Name:
-
TN
-
Voltage:
-
220V
-
Power:
-
≤20KW
-
Weight (KG):
-
100
-
Product name:
-
Magnetron Target Sputter Coater
-
Keywords:
-
Easy to use
-
chamber size:
-
180mm x 215mm
-
Sample stage size:
-
150mm
-
Magnetron sputtering target:
-
2" x 1 target
-
Ultimate vacuum:
-
1.0E-4Pa
-
Vacuum chamber material:
-
SS304 stainless steel
-
Mechanical pump:
-
Imported oil-free diaphragm pump
-
Vacuum measurement:
-
Resistance gauge + ionization gauge
-
Pumping rate:
-
Oil-free pump 0.49L/s Molecular pump: 40L/S
Lab DC Power Single Magnetron Target Sputter Coater with Stainless Chamber
Sputtering is a plasma based deposition process in which energetic ions are accelerated towards a target. The ions strike the target and atoms are ejected (or sputtered) from the surface. These atoms travel towards the substrate and incorporate into the growing film.
This DC power single magnetron target sputter coater is very suitable for aluminum plating and other materials that are very sensitive to air. This magnetron sputtering coater equipment has compact structure and perfect function and is easy to use, and is very suitable for various coating tests.
| Sample stage | Size | φ100mm |
| Rotating speed | 0-20rpm adjustable | |
| Heating | Max. 500ºC | |
| Magnetron sputtering head | Quantity | 2" x1 |
| Vacuum chamber | Chamber size | φ180mm x 215mm |
| Observation window | Omnidirectional transparent | |
| Chamber material | SS304 | |
| Open method | Upper cover removable | |
| Vacuum system | Mechanical pump | Rotary vane pump |
| Pumping port | KF16 | |
| Exhaust interface | KF16 | |
| Molecular pump | Turbo-molecular pump | |
| Pumping port | KF40 | |
| Exhaust interface | KF40 | |
| Vacuum measurement | Resistance gauge + ionization gauge | |
| Ultimate vacuum | 1.0E-4Pa | |
| Power supply | AC 220V 50/60Hz | |
| Pumping rate | Mechanical pump 1.1L/s Molecular pump 600L/s | |
| Power configuration | Quantity | DC power supply x1 |
| Max. output power | DC power supply 500W | |
| Supply voltage | AC220V, 50Hz | |
| Others | Total power | 2KW |
| Overall size | 550mm x 350mm x 500mm |
1. We have magnetron sputter coater with 1 target, 2 targets, 3 targets, target can be designed at the top or bottom of the chamber.
2. DC and RF target is available.
3. Strong magnetic target and Pernanent magenetic target is optional
4. Customized service is always available!
