- Product Details
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Quick Details
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Place of Origin:
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Henan, China
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Product name:
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Magnetron sputtering target
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Keyword:
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Al target
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Purity:
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99.99%, 99.999%
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Shape:
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flat target, the size according to your request
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Available size:
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Dia 25~300mm, Thickness:3~10mm
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Technics:
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Vacuum Melting, Patented thermo-mechanical process
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Application:
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plasma coater target material
Quick Details
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Warranty:
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1 year
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Brand Name:
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MGSI
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Model Number:
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MG-TGT-Al
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Place of Origin:
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Henan, China
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Product name:
-
Magnetron sputtering target
-
Keyword:
-
Al target
-
Purity:
-
99.99%, 99.999%
-
Shape:
-
flat target, the size according to your request
-
Available size:
-
Dia 25~300mm, Thickness:3~10mm
-
Technics:
-
Vacuum Melting, Patented thermo-mechanical process
-
Application:
-
plasma coater target material
Pure aluminum target High purity aluminum target 4N5N aluminum silicon alloy target Magnetron sputtering target size can be customized
High purity aluminum Sputtering Target AL Target for Magnetron Sputtering Coating
Introduce
Name: AL target Purity: 4N-5N (99.99%-99.999%) Target introduction The coating target is a sputtering source that forms various functional thin films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate process conditions. Simply put, the target is the target material bombarded by high-speed energetic particles. It is used in high-energy laser weapons. When lasers with different power densities, different output waveforms, and different wavelengths interact with different targets, they will produce different killing and damage. effect. For example: evaporation magnetron sputtering coating is heating evaporation coating, aluminum film and so on. By replacing different target materials (such as aluminum, copper, stainless steel, titanium, nickel targets, etc.), you can get different film systems (such as super-hard, wear-resistant, anti-corrosion alloy film, etc.).
Material: Aluminum, Al
Size: 1" dia.x 0.125" thickness
Purity: 4N (99.99%)
