- Product Details
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Quick Details
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Dimension(L*W*H):
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620 L *600 W *600 H
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Packaging Details:
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standard export package
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Power(W):
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550W/750W
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Dimension:
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620 L *600 W *600 H
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Product name:
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Plasma cleaner
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Key word:
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2-50L plasma cleaner
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Application:
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Glass / cloth / metal
Quick Details
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Place of Origin:
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Henan, China
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Brand Name:
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TN
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Power:
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550W/750W
-
Dimension(L*W*H):
-
620 L *600 W *600 H
-
Packaging Details:
-
standard export package
-
Power(W):
-
550W/750W
-
Dimension:
-
620 L *600 W *600 H
-
Product name:
-
Plasma cleaner
-
Key word:
-
2-50L plasma cleaner
-
Application:
-
Glass / cloth / metal
Hot sale RF Plasma Cleaner / Etcher with Vacuum Pump. (12 Liter, 13.56 Mhz, 80W max. )
Product Description
TN-PCE-8 is a plasma cleaner or etching unit with 8.5 "Dia x 14“"Length quartz chamber and 0 - 80W variable RF power. It is designed to clean and remove nano-scale organic contamination on the substrate or wafer up to 8" using air, oxygen, or argon plasma. The rate of organic removal is about 20 nm/min Maximum at high RF power. It is an excellent tool to pre-clean single crystal substrate before epitaxial film deposition to achieve the better quality. If you do not have experience for plasma surface cleaning, please refer to the articles as the follows. It also can be used as plasma etcher at higher RF power.
(Factory supply, specifications can be customized according to customer requirements.)
SPECIFICATIONS
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Input Power |
AC110V/ 220V , 50/60 Hz, RF Power:80 W Max. ( standard ) Vacuum Pump:normal 550W, start 750W Total Power:830W max. Working current<= 3A |
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RF Power |
RF power is adjustable within 0 - 80W RF frequency:13,56 MH Optional:300 W RF power supply is available upon request at extra cost |
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8.5" O.D x 8.2" I.D x 14" L high purity quartz chamber Volume: 12 L Hinged type front flange made of aluminum 2.3" Dia. ( 60mm) quartz window for easy observation Totally RF radiation shield with zero RF leaking |
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Control Panel |
6" color touch screen to control all parameters automatically for plasma cleaning, such as vacuum level, gas flow rate, RF power level, and cleaning time. Built in one channel Mass flow meter ( 0 - 500ml/minute) to control gas flow within +/- 0.5 ml/m |
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Vacuum Pump and Valve
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240 L/m Heavy Duty Rotary Vane Vacuum Pump with Exhaust Filter, KF25D Adaptor and Clamp are included for immediate use Ultimate total pressure of 50 mTorr |
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Inert Gas |
Many inert gases can be chosen for plasma cleaning such as N2, Ar, Air and mixed gas depended on what kind material will be treated. ( not included in the package) No flammable gas shall be used for the plasma cleaner |
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Optional |
May use 2" - 6" wafer quartz boat , as round wafer sample holder.( click underlined to order at extra cost ) May use 2 - 4 channel gas delivery system to fill mixing gases ( click underlined to order ) May order quartz boat for clean standard wafer 1- 6 "
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Overall Dimensions |
620 L ×600 W ×600 H, mm 24" x 23.5" x 23.5" ( inch ) |
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Shipping Weight&Dimension |
350 lbs with vacuum pump 48"x40"x37" |
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Warranty |
One year limited warranty with lifetime support ( no warranty for Pyrex glass chamber ) |
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Application Note |
Please test the best plasma power based on your application by yourselves For plasma cleaning, usually keep RF power between 10 - 30W depended on sample material to be cleaner. For Plasma etching, usually keep RF power between 35 - 80 W depended on sample material to be cleaner. High power RF power supply is available upon request up to 300W at extra cost. |
Packaging & Shipping
Our Services
1.We?are?a?manufacturer?so?that?we?have?the?punctual?delivery?time.
2.One?sales?representative?serves?you?from?inquiry?to?products?shipped?out.Communicate?directly?and?conveniently.
3.Professional?R&D?team.
4.Strict QC.
5.Smooth?shipping.
6.Rich experience.?We?do?OEM?services.Our customers are all?over the world like USA,UK,Russia,Korea,Southeast
Asia,etc.so that we?are quite experienced.
7.Certificate:All our products are CE approval.
8.Fast reply:Ourteam will respond your requests within 8-working-hour
