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99.95%  Nickel Chrome Alloy Metal NiCr 80/20 wt% Sputtering Target For PVD Coating
99.95%  Nickel Chrome Alloy Metal NiCr 80/20 wt% Sputtering Target For PVD Coating
99.95%  Nickel Chrome Alloy Metal NiCr 80/20 wt% Sputtering Target For PVD Coating
99.95%  Nickel Chrome Alloy Metal NiCr 80/20 wt% Sputtering Target For PVD Coating
99.95%  Nickel Chrome Alloy Metal NiCr 80/20 wt% Sputtering Target For PVD Coating
99.95%  Nickel Chrome Alloy Metal NiCr 80/20 wt% Sputtering Target For PVD Coating
99.95%  Nickel Chrome Alloy Metal NiCr 80/20 wt% Sputtering Target For PVD Coating
99.95%  Nickel Chrome Alloy Metal NiCr 80/20 wt% Sputtering Target For PVD Coating

99.95% Nickel Chrome Alloy Metal NiCr 80/20 wt% Sputtering Target For PVD Coating

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Quick Details

Model Number:
NiCr sputtering target
Shape:
plannar
Material:
Nickel+Chrome, Nickel + Chrominum
Chemical Composition:
Ni+Cr
Name:
99.95% Nickel Chrome Alloy Metal NiCr 80/20 wt% Sputtering Target
Color:
Metal Color
Purity:
High Purity
Certificate:
ISO9001
Size:
Accept Custom
Surface:
Polishing Surface
Grade:
Industrial Grade
Usage:
thin film coating

Quick Details

Application:
PVD process
Place of Origin:
Hunan, China
Brand Name:
XK
Model Number:
NiCr sputtering target
Shape:
plannar
Material:
Nickel+Chrome, Nickel + Chrominum
Chemical Composition:
Ni+Cr
Name:
99.95% Nickel Chrome Alloy Metal NiCr 80/20 wt% Sputtering Target
Color:
Metal Color
Purity:
High Purity
Certificate:
ISO9001
Size:
Accept Custom
Surface:
Polishing Surface
Grade:
Industrial Grade
Usage:
thin film coating
Product Description

Thin film coating materials 99.95% Nickel Chrome NiCr sputtering target

Product Name

Nickel Chrome NiCr sputtering target

Available Purity(%)

99.9(3N); 99.95(3N5)

Shape

Plannar,Rotary

Technology
Vacuum Melting, Patented thermo-mechanical process and machine work
Application
Glass Coating & Decoration etc.
Process

Thanks to the special forming processes we use, Sputtering targets’ actual density almost reach 100 %. Our customers benefit from a faster process due to higher sputtering speeds. our production processes for NiCr20 sputtering target are:

Analysis

The sputtering targets we produced are high purity, it’s most important benefits are that your films possess an outstanding level of electrical conductivity and minimized particle formation during the PVD process. Below form is a typically Certificate of analysis for 3N5 high purity NiCr20 sputtering target.

Analytical Methods:
1. Metallic elements were analyzed using GDMS.
2. Gas elements were analyzed using LECO.

Packaging & Delivery
Packaging
Vacuum sealed package inside; Wooden case outside for 99.95% Nickel Chrome (NiCr)sputtering target
Delivery
15-20 days after order of 99.95% 3N5 Nickel Chrome (NiCr) sputtering target
Certifications

ISO 9001 certificate

Since the beginning of 2013, Changsha Xinkang Advanced Materials Co.,Ltd (XK) had been committed to an IS0 9001 certification procedure, aimed at optimizing products quality and customer satisfaction. In December 2014, after successfully passing an audit by ZDHY, , XK was awarded the Certificate of conformity to the ISO 9001 standard for all its activities.

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