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Titanium Alloy pvd Targets/Titanium Sputtering Targets
Titanium Alloy pvd Targets/Titanium Sputtering Targets
Titanium Alloy pvd Targets/Titanium Sputtering Targets
Titanium Alloy pvd Targets/Titanium Sputtering Targets
Titanium Alloy pvd Targets/Titanium Sputtering Targets
Titanium Alloy pvd Targets/Titanium Sputtering Targets
Titanium Alloy pvd Targets/Titanium Sputtering Targets
Titanium Alloy pvd Targets/Titanium Sputtering Targets

Titanium Alloy pvd Targets/Titanium Sputtering Targets

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≥10 Kilograms
US $19
≥100 Kilograms
US $18
≥1000 Kilograms
US $17
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Quick Details

Model Number:
titanium
Shape:
round
Material:
High purity titanium sponge, Ti: 99.995%min
Chemical Composition:
Ti: 99.995%min
Keywords:
High density
Feature:
high purity
Size:
high precision
MOQ:
1pcs
Surface Roughness:
Ra 0.8-1.6
Tolerance:
+/-0.005mm
Thickness:
Min:0.3mm
Surface:
hight Glossy
Certificate:
ISO9001, ISO14001, OHSAS18001

Quick Details

Application:
Aviation, industry,medical treatment,
Place of Origin:
Shaanxi, China
Brand Name:
YMD
Model Number:
titanium
Shape:
round
Material:
High purity titanium sponge, Ti: 99.995%min
Chemical Composition:
Ti: 99.995%min
Keywords:
High density
Feature:
high purity
Size:
high precision
MOQ:
1pcs
Surface Roughness:
Ra 0.8-1.6
Tolerance:
+/-0.005mm
Thickness:
Min:0.3mm
Surface:
hight Glossy
Certificate:
ISO9001, ISO14001, OHSAS18001
Product Description

Titanium target

The working principle of titanium targets is related to a series of physical and chemical reactions and is widely used in physical vapor deposition (PVD), including magnetron sputtering, ion beam sputtering and other methods. In these methods, titanium targets are a key raw material. In the working process, the titanium target is bombarded with ions, and the kinetic energy of the ions is converted into the ionization energy of titanium atoms, which makes the titanium atoms sputtered from the target. These sputtered titanium atoms fly to the substrate in a vacuum environment and deposit on the substrate to form a film. In this process, the energy and speed of sputtering, as well as the quality and pressure of the vacuum environment have an effect on the properties of the film. The advantage of titanium target is that it can provide titanium atoms with high purity and uniform particle size, which is conducive to the formation of high-quality titanium films or other titanium compound films. The quality and purity of the titanium target directly affect the properties of the final film, including the optical properties of the film, hardness, corrosion resistance and so on. The working principle of the titanium target is basically the process of using the energy of ion bombardment to sputtering titanium atoms onto the substrate to form a film.

Titanium target feature

1 High density Smelting equipment technical modification target density increased to 95-99%.
2 High purity Special raw material impurity content low purity increased to 99.99%min.
3 High precision Precision CNC machine with center tolerance of 0.005mm surface roughness of 0.8~1.6Ra
item
value
Place of Origin
China
Shaanxi
Brand Name
YMD
Model Number
titanium
Application
Aviation, industry,medical treatment,
Shape
round
Material
High purity titanium sponge
Chemical Composition
Ti: 99.995%min
Keywords
High density
Feature
high purity
Size
high precision
Material
Ti: 99.995%min
MOQ
1pcs
Surface Roughness
Ra 0.8-1.6
Tolerance
+/-0.005mm
Thickness
Min:0.3mm
Surface
hight Glossy
Certificate
ISO9001, ISO14001, OHSAS18001
Specification
Packing & Delivery
In plywood case with plastic film.
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