Input Power

Single phase 220 VAC 50 / 60 Hz, 2000 W (including vacuum pump and water chiller)

Source Power

• Two sputtering power sources are integrated into one control box

• DC source: 500 W power for coating metallic materials

• RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials

Magnetron Sputtering Head

• Two 2" Magnetron Sputtering Heads with water cooling jackets and shutters are included

• One Sputting Head Model also available in this product page (in product options)

• One is connected to DC source for coating metallic materials

• The other one is connected to RF source for non-conductive materials

• Target size requirement: 2" diameter

• Thickness range: 0.1 - 5 mm for both metallic and non-conductive targets (including backing plate)

• One Stainless Steel Target target and one Research Grade Al2O3 target are included for demo testing

• Customized coater: Two DC heads without RF; two RF heads without DC; 3 RF heads are available upon request

Vacuum Chamber

• Vacuum chamber: 300 mm Dia. ×300 mm Height, made of stainless steel

• Viewport: Two pieces of 100 mm Dia. glass. One fixed; one detachable for cleaning and replacement

• Hinged type lid with pneumatic power pole allows easy target change

Sample Stage

• Sample holder is a rotatable and heatable stage made of ceramic heater with copper cover

• Sample holder size: 140 mm Dia. for. 4" wafer max

• Rotation speed: 1-20 rpm adjustable for uniform coating

• The holder temperature is adjustable from RT to 500 °C max (2 hr max) with accuracy +/- 1.0 °C via a digital temperature controller

Gas Flow Control

• Two precision mass flow controllers (MFC) are installed to allow inlet of two types of gasses

• Flow rate: 0–200 mL/min adjustable on the touch screen control panel

• Air inlet valve is installed for vacuum release

Vacuum Pump Station

• A mobile pump station is included. The sputtering coater can be placed on top of station

• High-speed turbo pump at speed 80L/S is combined with a two-stage mechanical pump (220 L/min) for max vacuum level and faster pumping speed

• Standard vacuum level connected with chamber : < 4.0E-5 Torr. (1.0E-6 Torr with chamber baking )

Water Chiller

• One digital temperature controlled recirculating water chiller is included.

• Refrigeration range: 5~35 °C

• Flow rate: 16 L/min

• Pump pressure: 14 psi

Overall Dimensions

Lid closed: 48" × 28" × 32"

Lid open: 48" × 28" × 37"

Net Weight

160 kg

Warranty

One years limited warranty with lifetime support